Thin film transistor substrate and its manufacture

ABSTRACT

A semiconductor layer with a threshold voltage for n-channel is formed and patterned to TFT island areas. A gate insulating film is deposited. The first gate electrode layer is formed and pattered to form an opening. Phosphorous ions are implanted into a p-channel TFT in the opening to set threshold voltage for p-channel TFT. A second gate electrode layer is formed and patterned to form second gate electrodes. By using the first gate electrode layer as a mask, boron ions are implanted at a high concentration to form source/drain regions of the p-channel TFT. By using the second gate electrodes as a mask, the first gate electrode layer is etched to form gate electrodes. Phosphorous ions are implanted at a low concentration to form LDD regions. By using a fourth mask, P ions are implanted at a high concentration to form source/drain regions of n-channel TFTs.

CROSS REFERENCE TO RELATED APPLICATION

[0001] This application is based on and claims priority of JapanesePatent Application No. 2003-017306 filed on Jan. 27, 2003, the entirecontents of which are incorporated herein by reference.

BACKGROUND OF THE INVENTION

[0002] A) Field of the Invention

[0003] The present invention relates to a thin film transistor substrateand its manufacture method, and more particularly to a thin filmtransistor substrate having n- and p-channel transistors and itsmanufacture method.

[0004] B) Description of the Related Art

[0005] Thin film transistors are used for driving pixels of a liquidcrystal display. For example, by using a polysilicon thin film, pixeldriving thin film transistors can be formed in a display area andperipheral circuit thin film transistors can be formed in an area otherthan the display area.

[0006] Pixel driving thin film transistors are required to have a smallleak current and are made of n-channel MOS thin film transistors (TFT)having lightly doped drain (LDD) regions. Peripheral circuit thin filmtransistors are required to have a small power consumption and arepreferably made of complimentary (C) MOSTFTs. For a stable operation,n-channel TFTs of CMOSTFTs are desired to have the LDD structure. If ahigh speed operation is desired, it is preferable that both p-channeland n-channel transistors of CMOSTFTs have the structure without LDDregions, because the LDD regions hinder the high speed operation.

[0007] As an amorphous silicon thin film formed on a glass substrate ispolycrystallized by applying an excimer laser beam, the thresholdvoltage of the polysilicon thin film transistor shifts largely to theminus side. It is necessary to dope p-type impurities such as boron toset the threshold voltage to 0 V (for example, refer to Japanese PatentLaid-open Publication HEI-03-006865).

[0008] Even if the threshold voltage is adjusted to 0 V, it is difficultto lower leak current at a voltage 0 of both n- and p-channeltransistors due to a small margin.

[0009] In order to adjust the threshold voltages of both n- andp-channel transistors to have desired values, it is necessary to performdifferent impurity doping processes for n- and p-channel transistors(for example, refer to Japanese Patent Laid-open PublicationsHEI-04-290467, HEI-11-135801, and 2001-092373). At least one mask istherefore required.

[0010] Two masks are required to form high impurity concentrationsource/drain regions. Two masks are required to pattern a silicon thinfilm and a gate electrode layer. Five masks at the minimum are thereforerequired to manufacture CMOS TFTs. It is desired to reduce the number ofmasks in order to manufacture liquid crystal displays with a highmanufacture yield and at a low manufacture cost.

SUMMARY OF THE INVENTION

[0011] It is an object of the present invention to provide a method ofmanufacturing a thin film transistor substrate capable of controllingthe threshold voltages of both n- and p-channel transistorsindependently by using the smaller number of masks.

[0012] It is another object of the present invention to provide a thinfilm transistor substrate having the threshold voltages of both n- andp-channel transistors controlled independently and manufactured by usingthe smaller number of masks.

[0013] According to one aspect of the present invention, there isprovided a manufacture method for a thin film transistor substrate,comprising the steps of: (a) forming a semiconductor layer on asubstrate, the semiconductor layer having a threshold voltage suitablefor an n-channel transistor; (b) pattering the semiconductor layer intoisland areas by using a first mask to define an area of a pixel drivingn-channel transistor with LDD regions, an area of a CMOS n-channeltransistor and an area of a CMOS p-channel transistor; (c) forming agate insulating film and a first gate electrode layer to cover thesemiconductor layer patterned to form the island areas; (d) patterningthe first gate electrode layer by using a second mask to form a firstgate electrode layer having an opening in the CMOS p-channel transistorarea; (e) by using the first gate electrode layer as a mask, implantingn-type impurity ions into the CMOS p-channel transistor area in theopening to set a threshold voltage suitable for the CMOS p-channeltransistor; (f) after the step (e), forming a second gate electrodelayer covering the first gate electrode layer; (g) etching the secondgate electrode layer by using a third mask to form second gateelectrodes having a gate electrode shape; (h) by using the second gateelectrodes and the first gate electrode layer as a mask, implanting highconcentration p-type impurity ions into the CMOS p-channel transistorarea to form high impurity concentration source/drain regions; (i) byusing the second gate electrodes as a mask, etching the first gateelectrode layer to form gate electrodes of the n-channel transistors;(j) implanting low concentration n-type impurity ions to form the LDDregions in the area of the n-channel transistor with the LDD regions;and (k) by using a fourth mask covering the CMOS p-channel transistorarea and the LDD regions in the area of the n-channel transistor withthe LDD regions, implanting high concentration n-type impurity ions toform high impurity concentration source/drain regions of the n-channeltransistors.

[0014] According to another aspect of the present invention, there isprovided a manufacture method for a thin film transistor substrate,comprising the steps of: (a) forming a semiconductor layer on asubstrate, the semiconductor layer having a threshold voltage suitablefor a p-channel transistor; (b) pattering the semiconductor layer intoisland areas by using a first mask to define an area of a pixel drivingn-channel transistor with LDD regions, an area of a CMOS n-channeltransistor and an area of a CMOS p-channel transistor; (c) forming agate insulating film and a first gate electrode layer to cover thesemiconductor layer patterned to form the island areas; (d) patterningthe first gate electrode layer by using a second mask to form a firstgate electrode layer covering the CMOS p-channel transistor area andhaving an opening in the n-channel transistor areas; (e) by using thefirst gate electrode layer as a mask, implanting p-type lowconcentration impurity ions into the n-channel transistor areas in theopening to set a threshold voltage suitable for the n-channeltransistors; (f) after the step (e), forming a second gate electrodelayer covering the first gate electrode layer; (g) etching the secondgate electrode layer by using a third mask to form a second gateelectrode layer having a gate electrode shape covering a channel regionand the LDD regions in the area of the n-channel transistor with the LDDregions and having a gate electrode shape covering each channel regionof the other transistor areas; (h) by using the second gate electrodelayer and the first gate electrode layer as a mask, implanting firsthigh concentration impurity ions into the n-channel transistor areas toform high impurity concentration source/drain regions; (i) by using thesecond gate electrode layer as a mask, etching the first gate electrodelayer; (j) forming a fourth mask exposing the CMOS p-channel transistorarea and covering at least a gate electrode area in the area of then-channel transistor with the LDD regions; (k) implanting second highconcentration p-type impurity ions having a concentration lower than thefirst high concentration to form high impurity concentrationsource/drain regions in the p-channel transistor area; (I) by using thefourth mask as an etching mask, etching the second gate electrode layerto pattern a gate electrode of the n-channel transistor with the LDDregions; and (m) implanting low concentration n-type impurity ions toform the LDD regions of the n-channel transistor with the LDD regions.

[0015] According to still another aspect of the present invention, thereis provided a thin film transistor substrate comprising: a substrate; afirst transistor structure having a first semiconductor layer formed onthe substrate, a first gate insulating film and a first gate electrode,wherein a channel region of the first semiconductor layer under thefirst gate electrode is intentionally doped with only p-type impurities,the first semiconductor layer includes n-type LDD regions outside thechannel region and high impurity concentration n-type source/drainregions outside the n-type LDD regions, and the first gate electrode ismade of a lamination of a first metal layer and a second metal layer; asecond transistor structure having a second semiconductor layer formedon the substrate, a second gate insulating film and a second gateelectrode, wherein a channel region of the second semiconductor layerunder the second gate electrode is intentionally doped with only p-typeimpurities, the second semiconductor layer includes high impurityconcentration n-type source/drain regions outside the channel region,and the second gate electrode is made of a lamination of the first metallayer and the second metal layer; and a third transistor structurehaving a third semiconductor layer formed on the substrate, a third gateinsulating film and a third gate electrode, wherein a channel region ofthe third semiconductor layer under the third gate electrode isintentionally doped with p-type impurities and n-type impurities, thethird semiconductor layer includes high impurity concentration p-typesource/drain regions outside the channel region, and the third gateelectrode is made of the second metal layer.

[0016] According to still another aspect of the present invention, thereis provided a thin film transistor substrate comprising: a substrate; afirst transistor structure having a first semiconductor layer formed onthe substrate, a first gate insulating film and a first gate electrode,wherein a channel region of the first semiconductor layer under thefirst gate electrode is intentionally doped with only p-type impurities,the first semiconductor layer includes n-type LDD regions outside thechannel region and high impurity concentration n-type source/drainregions outside the n-type LDD regions, and the first gate electrode ismade of a second metal layer; a second transistor structure having asecond semiconductor layer formed on the substrate, a second gateinsulating film and a second gate electrode, wherein a channel region ofthe second semiconductor layer under the second gate electrode isintentionally doped with p-type impurities at the first impurityconcentration, the second semiconductor layer includes high impurityconcentration n-type source/drain regions outside the channel region,and the second gate electrode is made of the second metal layer; and athird transistor structure having a third semiconductor layer formed onthe substrate, a third gate insulating film and a third gate electrode,wherein a channel region of the third semiconductor layer under thethird gate electrode is intentionally doped with p-type impurities at asecond impurity concentration lower than the first impurityconcentration, the third semiconductor layer includes high impurityconcentration p-type source/drain regions outside the channel region,and the third gate electrode is made of a first metal layer havingetching characteristics different from etching characteristics of thefirst metal layer.

[0017] It is possible to manufacture n- and p-channel TFTs having properthreshold values with the smaller number of masks.

BRIEF DESCRIPTION OF THE DRAWINGS

[0018]FIGS. 1A to 1R are schematic cross sectional views illustrating athin film transistor substrate manufacture method according to a firstembodiment of the invention.

[0019]FIGS. 2A and 2B are graphs showing threshold values of transistorsmanufactured by the method illustrated in FIGS. 1A to 1R.

[0020]FIGS. 3A to 3J are schematic cross sectional views illustrating athin film transistor substrate manufacture method according to a secondembodiment of the invention.

[0021]FIGS. 4A and 4B are graphs showing threshold values of transistorsmanufactured by the method illustrated in FIGS. 3A to 3J.

[0022]FIGS. 5A and 5B are a plan view and a schematic cross sectionalview illustrating a liquid crystal display using a thin film transistorsubstrate formed by the embodiment method.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0023] With reference to FIGS. 1A to 1R and FIGS. 2A and 2B, descriptionwill be made on a thin film transistor substrate manufacture methodaccording to the first embodiment of the invention.

[0024] As shown in FIG. 1A, on the surface of a glass substrate 10, asilicon nitride layer 11 having a thickness of about 50 nm is formed byplasma enhanced (PE) chemical vapor deposition (CVD). The siliconnitride layer 11 is a diffusion preventing film for preventingimpurities from diffusing from the glass substrate 10 to upper layers.The silicon nitride layer of 50 nm or thicker can provide such adiffusion preventing function sufficiently. A general glass substrate isconsidered having a heat resistance temperature of about 500° C., andmanufacture processes are performed at a temperature lower than thisheat resistance temperature.

[0025] On the silicon nitride layer 11, a silicon oxide layer 12 havinga thickness of, for example, 200 nm is deposited by plasma CVD. Thissilicon oxide layer provides the function of promoting crystallinity ofa polysilicon layer to be formed on the silicon oxide layer. If thecrystallinity promotion effect of a polysilicon layer can be obtained, athinner silicon oxide layer may be used, for example, having a thicknessof 100 nm.

[0026] On the silicon oxide layer 12, an amorphous silicon layer 13 isdeposited by PECVD to a thickness of, for example, 40 nm. When theamorphous silicon layer is polycrystallized by an XeCI excimer laserbeam, the amorphous silicon layer 13 is preferably in the thicknessrange from 40 nm to 60 nm. When a different laser beam is used forpolycrystallization, the thickness of an amorphous silicon layer ispreferably changed based on a laser type. For example, when a YVO₄ laserbeam is used, a thicker amorphous silicon layer is formed, for example,to a thickness of 70 nm to 100 nm. The narrow left area in FIGS. 1A to1R is a display area DISPLAY, and the broad right area is a peripheralcircuit area PERIPHERAL. In the display area, pixel driving n-channelTFTs with LDD regions are formed, and in the peripheral circuit area,CMOSTFTs are formed.

[0027] As shown in FIG. 2A, if an undoped amorphous silicon layer isformed and polycrystallized upon application of a laser beam, a thinfilm transistor formed by using the polysilicon layer has a thresholdvalue largely shifted to the minus potential side. In order to adjustthe threshold value to have a proper value, it is necessary to dopep-type impurities.

[0028] As shown in FIG. 1A, boron (B) ions as p-type impurities areimplanted into the amorphous silicon layer 13 by using an ion dopingsystem at an acceleration energy of 10 keV and a dose of 2×10¹²cm⁻².This B concentration can control an n-channel TFT to have a properthreshold value.

[0029] As shown in FIG. 1B, an excimer laser beam Ex is applied to theamorphous silicon layer 13 to crystallize it. The amorphous siliconlayer melts and hardens to be changed to a polysilicon layer.

[0030] As shown in FIG. 1C, a resist pattern M11 of an island shapecorresponding to each TFT is formed on the polysilicon layer 13. Byusing the resist pattern M11 as an etching mask, the polysilicon layer13 exposed outside the resist pattern M11 is dry-etched byfluorine-containing gas. The resist pattern M11 is thereafter removed.

[0031] As another method of doping B into the amorphous silicon layer13, B₂H₆ gas as B source may be added to SiH₄ gas as silicon source byabout several ppm when the amorphous silicon layer is formed. The orderof the B ion doping process and the crystallization process by excimerlaser may be reversed. After the polysilicon layer is patterned toisland areas, B ions may be implanted.

[0032] Three island polysilicon layers shown in FIG. 1C are: a leftpolysilicon region 13 a which is used for forming an n-channel TFT withthe LDD regions in the display area; a center polysilicon region 13 bwhich is used for forming an n-channel TFT without LDD regions in theperipheral circuit area; and a right polysilicon region 13 c which isused for forming a p-channel TFT without LDD regions in the peripheralcircuit area.

[0033] The n-channel TFT of the peripheral circuit does not have the LDDregions in this example. If a CMOS circuit is to be made by n-channelTFTs with LDD regions and p-channel TFTs without LDD regions, the centerTFT is formed by the method similar to that used for the left TFT.

[0034] As shown in FIG. 1D, a silicon oxide layer 15 having a thicknessof about 30 nm is formed, for example, by PECVD, covering the islandpolysilicon layers 13 a to 13 c. This silicon oxide layer 15 is aninsulating layer to be used as a gate insulating film. On the siliconoxide layer 15, an Mo layer 16 is formed by sputtering to a thicknessof, for example, 200 nm. The Mo layer is a first metal layer functioningas a mask and an etching stopper in the later processes and alsoconstituting a part of each gate electrode.

[0035] The gate insulating film is made as thin as about 30 nm byconsidering a later ion implantation process of implanting ions throughthe gate insulating film. However, the gate insulating film may be madethick, for example, about 100 nm by correspondingly raising theacceleration energy in the later ion implantation process.

[0036] As shown in FIG. 1E, a resist mask M12 is formed on the Mo layer16, covering the n-channel TFT area. The MO layer 16 in the p-channelTFT area is removed, for example, by wet etching. The resist pattern M12is thereafter removed. The left Mo layer 16 functions as a mask coveringthe n-channel TFT area.

[0037] As shown in FIG. 1F, phosphorus (P) ions as n-type impurities areimplanted by using an ion doping system under the conditions of, forexample, an acceleration energy of 30 keV and a dose of 1×10¹²cm⁻².Since the Mo layer 16 covers the n-channel TFT area, P ions areimplanted only into the p-channel transistor region 13 c through thegate insulating film. A portion of B impurity ions implanted in theprocess shown in FIG. 1A is cancelled out by P impurity ions implantedin the process shown in FIG. 1F, so that a proper threshold value is setto the p-channel TFT area.

[0038] As shown in FIG. 1G, covering the left Mo layer 16 and exposedgate insulating film 15, an Al—Ti alloy layer 18 having a thickness of,for example, 300 nm, is formed by sputtering. The Al—Ti alloy layer 18is a second metal layer to be used for gate electrodes. At least one ofthe first metal layer formed in the process shown in FIG. 1D and thesecond metal layer formed in the process shown in FIG. 1G forms gateelectrodes. The first and second metal layers have different etchingcharacteristics. Other conductive layers may be used in place of themetal layers. For example, a conductive semiconductor layer, a metalsilicide layer, a conductive metal nitride layer or the like may beused.

[0039] As shown in FIG. 1H, a resist pattern M13 having a gate electrodeshape is formed on the Al—Ti alloy layer 18 to dry-etch this layer bychlorine containing gas. The resist pattern M13 is thereafter removed. Agate electrode Gp of Al—Ti alloy is therefore formed on the gateinsulating film 15 in the p-channel TFT area. The Mo layer 16 as thefirst metal layer is not etched and covers the n-channel TFT area.

[0040] As shown in FIG. 11, by using the left Mo layer 16 and gateelectrode Gp as a mask, high concentration p-type impurities, forexample, B ions, are implanted into the p-channel TFT area. For example,B ions are implanted at an acceleration energy of 30 keV and a dose of2×10¹⁵cm⁻². High impurity concentration source-drain regions 19 of ap-channel TFT are therefore formed continuously with the channel regionunder the gate electrode Gp.

[0041] As shown in FIG. 1J, by using the Al—Ti electrode layers 18 x and18 y as a mask, the underlying Mo layer 16 is dry-etched by fluorinecontaining gas. A gate electrode Gd of an n-channel TFT with the LDDregions is therefore formed, the gate electrode Gd being a lamination ofa first metal layer 16 x and a second metal layer 18 x. A gate electrodeGn of a CMOS n-channel TFT without LDD regions is therefore formed, thegate electrode Gn being a lamination of a first metal layer 16 y and asecond metal layer 18 y.

[0042] As shown in FIG. 1K, low concentration n-type impurities, forexample, P ions, are implanted. P ions are implanted by using an iondoping system under the conditions of, for example, an accelerationenergy of 30 keV and a dose of 5×10¹³cm⁻². This P ion implantation formslow impurity concentration regions 21 of the n-channel TFTs. Althoughthe effective impurity concentration of the high impurity concentrationsource/drain regions 19 lowers slightly, the influence of this can beneglected.

[0043] As shown in FIG. 1L, a resist pattern M14 is formed covering thechannel and LDD regions of the n-channel TFT and the p-channel TFT area,and high concentration n-type impurities, for example, P ions, areimplanted. P ions are implanted by using an ion doping system under theconditions of, for example, an acceleration energy of 30 keV and a doseof 2×10¹⁵cm⁻². High impurity concentration source/drain regions 22 aretherefore formed in the n-channel TFT. The resist pattern M14 isthereafter removed.

[0044] As shown in FIG. 1M, an excimer laser beam Ex is applied toactivate the implanted impurities. An activation method may be otherwell-known methods, such as lamp annealing.

[0045] As described above, the first metal layer is formed covering then-channel TFTs, and used as a mask when ions are implanted for thecontrol of the threshold value of the p-channel TFT. The second metallayer is etched to form a gate electrode pattern. The first metal layeris also used as a hard mask on the n-channel TFTs when ions areimplanted to form the source/drain regions of the p-channel TFT.Thereafter, the first metal layer is etched by using the second metallayer as a mask. Only four masks are used to form three types of TFTstructures. Since the number of masks can be reduced, a thin filmtransistor substrate can be formed at a low manufacture cost while ahigh productivity is retained.

[0046] A thin film transistor substrate is completed thereafter by ausual manufacture method.

[0047] As shown in FIG. 1N, an interlayer insulating film 24 containinghydrogen is formed by PECVD. For example, a silicon nitride film 24having a thickness of 370 nm is formed by PECVD using SiH₄ and NH₃ assource gases. Thereafter, annealing is performed for 2 hours at 380° C.in a nitrogen atmosphere in order to hydrogenate the polysilicon layer.Since SiH₄ and NH₃ are used as the source gases, the silicon nitridelayer 24 contains a large amount of hydrogen. This hydrogen is diffusedinto the polysilicon layer and terminates dangling bonds.

[0048] As shown in FIG. 1O, a resist mask M15 is formed on theinterlayer insulating film 24, the resist mask having contact openings.By using the resist mask M15 as an etching mask, the interlayerinsulating film 24 and gate insulating film 15 are dry-etched byfluorine-containing gas. Contact holes 25 are therefore formed exposingthe high impurity concentration source/drain regions of each TFT. Theresist mask M15 is thereafter removed.

[0049] As shown in FIG. 1P, a third metal layer 27 for electrodes andwiring is formed on the interlayer insulating film 24. For example, a Tilayer about 100 nm thick, an Al layer about 200 nm thick, and a Ti layerabout 100 nm thick are stacked by sputtering to form the third metallayer 27.

[0050] As shown in FIG. 1Q, a resist pattern M16 is formed on the thirdmetal layer and dry-etched by chlorine-containing gas to pattern thethird metal layer 27. In FIG. 1Q, although only the electrodes incontact with the polysilicon layers in the source/drain regions areshown, the third metal layer 27 also forms a wiring pattern in otherareas. The resist pattern M16 is thereafter removed.

[0051] As shown in FIG. 1R, a second interlayer insulating film 28 isformed covering the third metal layer 27. An etching process similar tothat described with reference to FIG. 1O is performed to form an openingfor the drain region of the n-channel TFT with the LDD regions in thedisplay area. A transparent electrode layer of ITO or the like is formedto a thickness of about 70 nm, and etched by using a resist pattern toform a pixel transparent electrode 30.

[0052] With the above processes, the thin film transistor substrate fora liquid crystal display can be formed.

[0053] As shown in FIG. 2B, in the n-channel TFT area, the B ionimplantation shown in FIG. 1A changes the drain current Ids—gate voltageVg characteristics n1 to the characteristics n2 having proper risingcharacteristics.

[0054] In the p-channel TFT area, the B ion implantation shown in FIG.1A changes once the undoped characteristics p1 to the characteristicsp2, and thereafter, the P ion implantation shown in FIG. 1F cancels outa portion of the p-type impurities to change the characteristics p2 tothe characteristics p3. Therefore, n-channel TFTs and p-channel TFT canbe formed which have a small leak current at the gate voltage Vg of 0and proper threshold values.

[0055]FIGS. 3A to 3J illustrate a thin film transistor substratemanufacture method according to the second embodiment of the invention.Like elements to those of the first embodiment are represented by usingidentical symbols and the description thereof is simplified.

[0056] First, similar to the first embodiment, on a glass substrate 10,a silicon nitride layer 11 about 50 nm thick, a silicon oxide layer 12about 200 nm thick and an amorphous silicon layer 13 about 40 nm thickare formed. In this state, p-type impurities, for example, B ions, areimplanted at an acceleration energy of 10 keV and a dose of 1×10¹²cm⁻².In this embodiment, the B ion implantation is performed to set a properthreshold value of the p-channel TFT, which is different from the firstembodiment. The dose of B ions in the n-channel TFTs is insufficient andproper threshold values are not set as yet.

[0057] Thereafter, the processes similar to the first embodiment areperformed including a polycrystallization process for the amorphoussilicon layer upon application of an excimer laser beam, a patterningprocess for the polysilicon layer using a resist mask, and film formingprocesses for a gate insulating film 15 and a first gate electrode layer16.

[0058] As shown in FIG. 3B, by using a resist mask M22, the first gateelectrode layer 16 is patterned. The first gate electrode layer 16 ispatterned to cover the p-channel TFT area and expose the n-channel TFTarea. The resist mask M22 is thereafter removed.

[0059] As shown in FIG. 3C, low concentration p-type impurities, forexample, B ions, are implanted by using an ion doping system. Forexamples, B ions are implanted at an acceleration energy of 30 keV and adose of 1×10¹²cm⁻² by using an ion doping system.

[0060] B ions are additionally implanted in the n-channel TFT area wherethe first gate electrode layer 16 is not formed, so that properthreshold values are set to the channel regions.

[0061] As shown in FIG. 3D, a second gate electrode layer 18 is formedby sputtering, the layer 18 covering the first gate electrode layer 16and exposed gate insulating film 15. For example, an Al—Ti alloy layeris formed by sputtering to a thickness of about 300 nm.

[0062] As shown in FIG. 3E, a resist pattern M23 is formed on the secondgate electrode layer 18, and the second gate electrode layer 18 ispatterned. In the area of the n-channel TFT with the LDD regions, asecond gate electrode layer 18 x is formed by using the resist patterndefining LDD regions. In the area of the CMOS n-channel TFT, a gateelectrode 18 y is formed by using the resist pattern having a gateelectrode shape. In the area of the CMOS p-channel TFT, a second gateelectrode layer 18 z is formed by using the resist pattern having a gateelectrode shape. The first gate electrode layer 16 covering thep-channel TFT area is still left under the second gate electrode layer18 z.

[0063] As shown in FIG. 3F, high concentration n-type impurities, forexample, P ions, are implanted by using an ion doping system to formhigh impurity concentration source/drain regions 22 of n-channel TFTs.For example, P ions are implanted at an acceleration energy of 30 keVand a dose of 2×10¹⁵cm⁻².

[0064] As shown in FIG. 3G, by using the second gate electrode layer 18z as a mask, the underlying first gate electrode layer 16 is dry-etchedby fluorine-containing gas. A gate electrode Gp is therefore formed,which is a lamination of the first and second gate electrode layers 16and 18.

[0065] As shown in FIG. 3H, a resist pattern M24 is formed covering thesecond gate electrode layer 18 x in a gate electrode shape in the areaof the n-channel TFT with the LDD regions and covering the area of then-channel TFT without LDD regions.

[0066] By using the gate electrode Gp as a mask, high concentrationp-type impurity ions are implanted to form high impurity concentrationsource/drain regions of the p-channel TFT. In this case, although aportion of n-type impurities are cancelled out in the n-channel TFT withthe LDD regions, the impurity concentration is selected so that theremaining n-type impurities retain the high impurity concentrationsource/drain regions. For example, B ions are implanted at anacceleration energy of 30 keV and a dose of 1×10¹⁵cm⁻².

[0067] As shown in FIG. 31, by using the resist mask M24 as an etchingmask, the second gate electrode layer 18 x is etched. In the area of then-channel TFT with the LDD regions, the second gate electrode layer 18 xoutside the resist mask is etched and patterned to form a gate electrodeGd. In the p-channel TFT area, the second gate electrode layer on thefirst gate electrode layer is etched and only the first gate electrodelayer is left.

[0068] The resist mask M24 may be formed after the ion implantationshown in FIG. 3H to pattern and form the gate electrode Gd of then-channel TFT with the LDD regions.

[0069] As shown in FIG. 3J, low concentration n-type impurities, forexample, P ions, are implanted to form LDD regions 21. For example, Pions are implanted at an acceleration energy of 30 keV and a dose of5×10¹³cm⁻². The resist mask M24 is thereafter removed. After the resistmask M24 is removed, low concentration n-type impurity ions may beimplanted.

[0070] As shown in FIG. 4A, if an undoped polysilicon layer is used, thethreshold values of both the p-channel TFT and n-channel TFTs shiftlargely to the minus potential side.

[0071] As shown in FIG. 4B, in the p-channel TFT area, the B ionimplantation shown in FIG. 3A changes the undoped characteristics p1 tothe characteristics p2 having a proper threshold value. In the n-channelTFT area, the B ion implantation shown in FIG. 3A changes once thecharacteristics n1 to the characteristics n2, and thereafter, the B ionadditional implantation shown in FIG. 3C changes the characteristics n2to the characteristics n3 setting the proper threshold values of then-channel TFTs. Therefore, both n-channel TFTs and p-channel TFT canhave proper threshold values. Also in the second embodiment, three typesof TFT structures and proper threshold values can be obtained by usingthe four masks.

[0072] The CMOS n-channel TFT may be an n-channel TFT with the LDDregions, as mentioned in the first embodiment. In this case, two typesof transistor structures are formed. The method of forming the upperlayer structure after the transistor structures are formed is similar tothe first embodiment.

[0073]FIG. 5A is a schematic diagram showing the structure of a thinfilm transistor substrate formed by the embodiment method. A number ofpixels PIX are disposed in a matrix shape in a display area DIS of athin film transistor substrate 1. In each pixel PIX, a transparent pixelelectrode is connected to a corresponding thin film transistor TFT. Gateelectrodes of thin film transistors TFTs and gate wiring lines G areformed at a time by the same process. Electrodes of the source/drainregions of thin film transistors and signal wiring lines SIG are formedat a time by the same process. Peripheral circuits PER1 and PER2 areformed in upper and left areas relative to the display area DIS.

[0074]FIG. 5B is a schematic diagram showing the structure of a liquidcrystal display formed by using such a thin film transistor substrate. Athin film transistor substrate 1 and an opposing substrate 2 formed witha color filter are disposed facing each other and a liquid crystal layer3 is filled in a space between the two substrates.

[0075] The present invention has been described in connection with thepreferred embodiments. The invention is not limited only to the aboveembodiments. For example, although the first and second conductivelayers constituting gate electrodes are required to have differentetching characteristics, the materials of the first and secondconductive layers are not limited to those described in the embodiments.The interlayer insulating film is not limited to that described in theembodiment, but various inorganic or organic films may be used.

[0076] Although thin film transistors are formed on a glass substrate,they may be formed on a different transparent substrate such as a quartzsubstrate. In this case, thermal restrictions can be mitigated so thatthe selection degree of processes can be improved. It will be apparentto those skilled in the art that other various modifications,improvements, combinations, and the like can be made.

What we claim are:
 1. A manufacture method for a thin film transistorsubstrate, comprising the steps of: (a) forming a semiconductor layer ona substrate, said semiconductor layer having a threshold voltagesuitable for an n-channel transistor; (b) pattering said semiconductorlayer into island areas by using a first mask to define an area of apixel driving n-channel transistor with LDD regions, an area of a CMOSn-channel transistor and an area of a CMOS p-channel transistor; (c)forming a gate insulating film and a first gate electrode layer to coversaid semiconductor layer patterned to form the island areas; (d)patterning said first gate electrode layer by using a second mask toform a first gate electrode layer having an opening in the CMOSp-channel transistor area; (e) by using said first gate electrode layeras a mask, implanting n-type impurity ions into the CMOS p-channeltransistor area in the opening to set a threshold voltage suitable forthe CMOS p-channel transistor; (f) after said step (e), forming a secondgate electrode layer covering said first gate electrode layer; (g)etching said second gate electrode layer by using a third mask to formsecond gate electrodes having a gate electrode shape; (h) by using saidsecond gate electrodes and said first gate electrode layer as a mask,implanting high concentration p-type impurity ions into the CMOSp-channel transistor area to form high impurity concentrationsource/drain regions; (i) by using said second gate electrodes as amask, etching said first gate electrode layer to form gate electrodes ofthe n-channel transistors; (j) by using a fourth mask covering the CMOSp-channel transistor area and the LDD regions in the area of then-channel transistor with the LDD regions, implanting high concentrationn-type impurity ions to form high impurity concentration source/drainregions of the n-channel transistors; and (k) implanting lowconcentration n-type impurity ions to form the LDD regions in the areaof the n-channel transistor with the LDD regions.
 2. The manufacturemethod for a thin film transistor substrate according to claim 1,wherein the CMOS n-channel transistor has no LDD regions and said fourthmask has an opening corresponding to the MOS n-channel transistor area.3. The manufacture method for a thin film transistor substrate accordingto claim 1, wherein said step (a) comprises the subsidiary steps of:(a1) depositing said semiconductor layer on the substrate in anamorphous phase; (a2) implanting p-type impurity ions into saidsemiconductor layer at an impurity concentration which sets thethreshold voltage suitable for the n-channel transistor; and (a3)applying a laser beam to said semiconductor layer to change theamorphous phase to a polycrystallized phase.
 4. The manufacture methodfor a thin film transistor substrate according to claim 1, wherein saidfirst and second gate electrode layers have different etchingcharacteristics.
 5. The manufacture method for a thin film transistorsubstrate according to claim 1, wherein said first gate electrode layeris a refractory metal layer and said second gate electrode layer is analuminum alloy layer.
 6. The manufacture method for a thin filmtransistor substrate according to claim 1, further comprising the stepsof: (l) forming a first interlayer insulating film covering said threetypes of thin film transistor structures; (m) forming contact holesthrough said first interlayer insulating film and said gate insulatingfilm; (n) forming a conductive layer on said first interlayer insulatingfilm, said conductive layer covering said contact holes; (o) patteringsaid conductive layer to form electrodes and wiring lines; (p) forming asecond interlayer insulating film covering said electrodes and saidwiring lines; (q) forming contact holes through said second interlayerinsulating film; (r) forming a transparent electrode layer on saidsecond interlayer insulating film, said transparent electrode layercovering said contact holes; and (s) patterning said transparentelectrode layer to form a transparent electrode of each pixel.
 7. Amanufacture method for a thin film transistor substrate, comprising thesteps of: (a) forming a semiconductor layer on a substrate, saidsemiconductor layer having a threshold voltage suitable for a p-channeltransistor; (b) pattering said semiconductor layer into island areas byusing a first mask to define an area of a pixel driving n-channeltransistor with LDD regions, an area of a CMOS n-channel transistor andan area of a CMOS p-channel transistor; (c) forming a gate insulatingfilm and a first gate electrode layer to cover said semiconductor layerpatterned to form the island areas; (d) patterning said first gateelectrode layer by using a second mask to form a first gate electrodelayer covering the CMOS p-channel transistor area and having an openingin the n-channel transistor areas; (e) by using said first gateelectrode layer as a mask, implanting p-type low concentration impurityions into the n-channel transistor areas in the opening to set athreshold voltage suitable for the n-channel transistors; (f) after saidstep (e), forming a second gate electrode layer covering said first gateelectrode layer; (g) etching said second gate electrode layer by using athird mask to form a second gate electrode layer having a gate electrodeshape covering a channel region and the LDD regions in the area of then-channel transistor with the LDD regions and having a gate electrodeshape covering each channel region of the other transistor areas; (h) byusing said second gate electrode layer and said first gate electrodelayer as a mask, implanting first high concentration impurity ions intothe n-channel transistor areas to form high impurity concentrationsource/drain regions; (i) by using said second gate electrode layer as amask, etching said first gate electrode layer; (j) forming a fourth maskexposing the CMOS p-channel transistor area and covering at least a gateelectrode area in the area of the n-channel transistor with the LDDregions; (k) implanting second high concentration p-type impurity ionshaving a concentration lower than the first high concentration to formhigh impurity concentration source/drain regions in the p-channeltransistor area; (l) by using said fourth mask as an etching mask,etching said second gate electrode layer to pattern a gate electrode ofthe n-channel transistor with the LDD regions; and (m) implanting lowconcentration n-type impurity ions to form the LDD regions of then-channel transistor with the LDD regions.
 8. The manufacture method fora thin film transistor substrate according to claim 7, wherein the CMOSn-channel transistor has no LDD regions and said third mask has a gateelectrode shape above the CMOS n-channel transistor.
 9. The manufacturemethod for a thin film transistor substrate according to claim 7,wherein said fourth mask has a shape covering the CMOS n-channeltransistor area.
 10. The manufacture method for a thin film transistorsubstrate according to claim 7, wherein said step (a) comprises thesubsidiary steps of: (a1) depositing said semiconductor layer on thesubstrate in an amorphous phase; (a2) implanting p-type impurity ionsinto said semiconductor layer at an impurity concentration which setsthe threshold voltage suitable for the p-channel transistor; and (a3)applying a laser beam to said semiconductor layer to change theamorphous phase to a polycrystallized phase.
 11. The manufacture methodfor a thin film transistor substrate according to claim 7, wherein saidfirst and second gate electrode layers have different etchingcharacteristics.
 12. The manufacture method for a thin film transistorsubstrate according to claim 7, wherein said first gate electrode layeris a refractory metal layer and said second gate electrode layer is analuminum alloy layer.
 13. The manufacture method for a thin filmtransistor substrate according to claim 7, further comprising the stepsof: (l) forming a first interlayer insulating film covering said threetypes of thin film transistor structures; (m) forming contact holesthrough said first interlayer insulating film and said gate insulatingfilm; (n) forming a conductive layer on said first interlayer insulatingfilm, said conductive layer covering said contact holes; (o) patteringsaid conductive layer to form electrodes and wiring lines; (p) forming asecond interlayer insulating film covering said electrodes and saidwiring lines; (q) forming contact holes through said second interlayerinsulating film; (r) forming a transparent electrode layer on saidsecond interlayer insulating film, said transparent electrode layercovering said contact holes; and (s) patterning said transparentelectrode layer to form a transparent electrode of each pixel.
 14. Athin film transistor substrate comprising: a substrate; a firsttransistor structure having a first semiconductor layer formed on saidsubstrate, a first gate insulating film and a first gate electrode,wherein a channel region of said first semiconductor layer under saidfirst gate electrode is intentionally doped with only p-type impurities,said first semiconductor layer includes n-type LDD regions outside thechannel region and high impurity concentration n-type source/drainregions outside the n-type LDD regions, and said first gate electrode ismade of a lamination of a first metal layer and a second metal layer; asecond transistor structure having a second semiconductor layer formedon said substrate, a second gate insulating film and a second gateelectrode, wherein a channel region of said second semiconductor layerunder said second gate electrode is intentionally doped with only p-typeimpurities, said second semiconductor layer includes high impurityconcentration n-type source/drain regions outside the channel region,and said second gate electrode is made of a lamination of said firstmetal layer and said second metal layer; and a third transistorstructure having a third semiconductor layer formed on said substrate, athird gate insulating film and a third gate electrode, wherein a channelregion of said third semiconductor layer under said third gate electrodeis intentionally doped with p-type impurities and n-type impurities,said third semiconductor layer includes high impurity concentrationp-type source/drain regions outside the channel region, and said thirdgate electrode is made of said second metal layer.
 15. The thin filmtransistor substrate according to claim 14, wherein said secondsemiconductor layer has n-type LDD regions outside the channel region,and the high impurity concentration n-type source/drain regions outsidethe n-type LDD regions.
 16. The thin film transistor substrate accordingto claim 14, wherein said first and second metal layers have differentetching characteristics.
 17. The thin film transistor substrateaccording to claim 16, wherein said first metal layer is a refractorymetal layer and said second metal layer is an aluminum alloy layer. 18.A thin film transistor substrate comprising: a substrate; a firsttransistor structure having a first semiconductor layer formed on saidsubstrate, a first gate insulating film and a first gate electrode,wherein a channel region of said first semiconductor layer under saidfirst gate electrode is intentionally doped with only p-type impurities,said first semiconductor layer includes n-type LDD regions outside thechannel region and high impurity concentration n-type source/drainregions outside the n-type LDD regions, and said first gate electrode ismade of a second metal layer; a second transistor structure having asecond semiconductor layer formed on said substrate, a second gateinsulating film and a second gate electrode, wherein a channel region ofsaid second semiconductor layer under said second gate electrode isintentionally doped with p-type impurities at the first impurityconcentration, said second semiconductor layer includes high impurityconcentration n-type source/drain regions outside the channel region,and said second gate electrode is made of said second metal layer; and athird transistor structure having a third semiconductor layer formed onsaid substrate, a third gate insulating film and a third gate electrode,wherein a channel region of said third semiconductor layer under saidthird gate electrode is intentionally doped with p-type impurities at asecond impurity concentration lower than the first impurityconcentration, said third semiconductor layer includes high impurityconcentration p-type source/drain regions outside the channel region,and said third gate electrode is made of a first metal layer differentfrom said first metal layer.
 19. The thin film transistor substrateaccording to claim 18, wherein said second semiconductor layer hasn-type LDD regions outside the channel region, and the high impurityconcentration n-type source/drain regions outside the n-type LDDregions.
 20. The thin film transistor substrate according to claim 18,wherein said first metal layer has etching characteristics differentfrom those of said second metal layer.
 21. The thin film transistorsubstrate according to claims 20, wherein said first metal layer is arefractory metal layer and said second metal layer is an aluminum alloylayer.